Mixed Bed
IX process to polish the de-mineralized water to lower conductivity and SiO2 levels.

EDI
Chemical free continueous de-ionisation for excellent TDS, silica removal using DC current.

Ozonation
Advance oxidation process utilizing air, O2 or purified  water for ozone generation for very fast disinfection.

Mixed Bed
Lon Exchange process to polish the de-mineralized water conductivity and SiO2 levels.

UV
Chemical free disinfection using Ultra-violet radiation for microbial, TOC and ozone distruction.

CPU
Online high pressure  condensate  polishing plant with in-situ/external regeneration.